# positions[].organizations[].parent[].label
Texas A&M Engineering Experiment Station (TEES)

# keywords[]
4009 Electronics, Sensors And Digital Hardware

# keywords[]
4009 Electronics, Sensors And Digital Hardware

# keywords[]
4009 Electronics, Sensors And Digital Hardware

# keywords[]
4009 Electronics, Sensors And Digital Hardware

# keywords[]
5102 Atomic, Molecular And Optical Physics

# keywords[]
4009 Electronics, Sensors And Digital Hardware

# keywords[]
4009 Electronics, Sensors And Digital Hardware

# keywords[]
Electromagnetic Wave Sensors A-si:h Pin Diode

# keywords[]
4009 Electronics, Sensors And Digital Hardware

# keywords[]
3403 Macromolecular And Materials Chemistry

# educationAndTraining[].organization.label
Columbia University - (New York, New York, United States)

# awardsAndHonors[].label
Gordon E Moore Medal for Outstanding Achievement in Solid State Science and Technology

# awardsAndHonors[].label
Association of Former Students University-Level Distinguished Achievement Award, The

# awardsAndHonors[].label
Electronics and Photonics Division Award

# publications[].label
Electrical and Optical Characteristics of SSI-LED Made from Capacitor Containing Tri-Layer WOx Embedded Zr-Doped HfOx Gate Dielectric

# publications[].label
Post Deposition Annealing Atmosphere Effect on Performance of Solid State Incandescent Light Emitting Device

# publications[].label
EFFECTS OF INTERFACIAL CHARGES ON DOPED AND UNDOPED HfOx STACK LAYER WITH TIN METAL GATE ELECTRODE FOR NANO-SCALED CMOS GENERATION

# publications[].label
Chlorine plasma/copper reaction in a new copper dry etching process

# publications[].label
Status Review of Nanocrystals Embedded High-k Nonvolatile Memories

# publications[].label
Hydrogenation of amorphous silicon thin film transistors

# publications[].label
(Invited) TFT Technologies from Commercial Displays to Emerging Immersive Displays

# publications[].label
Nonvolatile Memory Characteristics of CdS Embedded Zr-Doped HfO2 High-k Dielectric MOS Capacitors

# publications[].label
Hafnium-doped tantalum oxide high k dielectrics

# publications[].label
Thin Film Transistors As Driving Devices for Attached Devices

# publications[].label
(Invited) Status of Room-Temperature Mass-Production Capability Plasma-Based Copper Etch Process

# publications[].label
Electromigration of Flat and Bent Copper Lines Patterned with a Plasma-Based Etch Process

# publications[].label
A new, room-temperature, high-rate plasma-based copper etch process

# publications[].label
Principles and Possible System-on-Wafer Applications of SSI-LEDs

# publications[].publisher
Institute of Electrical and Electronics Engineers (IEEE)

# publications[].label
Study on Lifetimes of Plasma Etched Ru Lines

# publications[].label
Dielectric relaxation and breakdown detection of doped tantalum oxide high-k thin films

# publications[].publisher
Institute of Electrical and Electronics Engineers (IEEE)

# publications[].label
Electron beam induced damage in N-rich SiNx films deposited by plasma enhanced chemical vapour deposition

# publications[].label
High Conductivity Gate Metallurgy for Tft/Lcd's

# publications[].label
Electrical reliability aspects of HfO2 high-k gate dielectrics with TaN metal gate electrodes under constant voltage stress

# publications[].label
ULSIC vs. TFT - What Can They Learn from Each Other?

# publications[].label
Microstructure modifications induced by bonded hydrogen in N-rich SiNx:H films

# publications[].label
Comparison of temperature, current density, and light intensity distributions of nano-resistor patterns for an improved solid state incandescent light emitting device simulation model

# publications[].label
Non-photosensitive, vertically redundant two-channel a-Si:H thin film transistor

# publications[].label
Comparison of simulated and measured light emission spectra from solid state incandescent light emitting devices

# publications[].label
Post Deposition Annealing Temperature Effect on White-Light Emitting of WOx Thin Film Stack on Si

# publications[].label
Deposition of richly conductive n(+) silicon film for a-Si : H thin film transistor

# publications[].label
A Novel Hole-Based Memory Device Fabricated from Nano ITO Embedded High-k Thin Films

# publications[].publisher
Institute of Electrical and Electronics Engineers (IEEE)

# publications[].label
(Invited) Oxide TFT Applications: Principles and Challenges

# publications[].label
USE OF ADSORBENTS FOR RECOVERY OF ACETIC-ACID FROM AQUEOUS-SOLUTIONS .2. FACTORS GOVERNING SELECTIVITY

# publications[].label
Room-temperature copper etching based on a plasma-copper reaction

# publications[].label
TFTs beyond LCD pixel driving and experience for 45 mm ULSIC process development

# publications[].label
A sixmask TFTLCD process using coppergate metallurgy

# publications[].label
Nonvolatile memories based on AlOx embedded ZrHfO high-k gate dielectric

# publications[].label
Single and Dual nc-ITO and nc-ZnO Embedded ZrHfO High-k Nonvolatile Memories

# publications[].label
A novel TFT-driven microchannel electrophoresis device for proteins separation and identification

# publications[].label
Mixed oxides as high-k gate dielectric films

# publications[].label
Anomalous high rate reactive ion etching process for indium tin oxide

# publications[].label
Study of hydrogenated amorphous silicon thin films as a potential sensor for He-Ne laser light detection

# publications[].label
Suppression of crystallization of tantalum oxide thin film by doping with zirconium

# publications[].label
Memory functions of nanocrystalline cadmium selenide embedded ZrHfO high-k dielectric stack

# publications[].label
THEORETICAL STUDY OF THE ETCHBACK PLANARIZATION PROCESS.

# publications[].label
Progress of Thin Film Transistor Technology

# publications[].publisher
Institute of Electrical and Electronics Engineers (IEEE)

# publications[].label
REACTIVE ION ETCH DAMAGES IN INVERTED, TRILAYER THIN-FILM TRANSISTOR

# publications[].label
Self-aligned Copper Oxide Passivation Layer - A Study on the Reliability Effect

# publications[].label
White-Light Emission SSI-LED Made of Sputter Deposited TiOx Thin Film on Si Wafer

# publications[].label
Estimation of the emission characteristics of solid-state incandescent light emitting devices by linear regression of spectral radiance

# publications[].label
REACTIVE ION ETCHING OF PLASMA ENHANCED CHEMICAL VAPOR-DEPOSITION AMORPHOUS-SILICON AND SILICON-NITRIDE - FEEDING GAS EFFECTS

# publications[].label
SLOPE CONTROL OF MOLYBDENUM LINES ETCHED WITH REACTIVE ION ETCHING

# publications[].label
Tantalum nitride interface layer influence on dielectric properties of hafnium doped tantalum oxide high dielectric constant thin films

# publications[].label
Exposure Light Wavelength Effects on Charge Trapping and Detrapping of nc-MoOx Embedded ZrHfO High-k Stack

# publications[].label
Welcome Remarks - H03: Thin Film Transistors 15 (TFT 15)

# publications[].label
Dielectric breakdown and charge trapping of ultrathin ZrHfO/SiON high-k gate stacks

# publications[].label
Polycrystalline Silicon Thin Film Formed By Multiple Pulsed Rapid Thermal Annealing  Intrinsic a-Si Film Thickness Effect

# publications[].label
PLASMA-BASED COPPER ETCH PROCESS AND RELIABILITY

# publications[].label
Nanocrystalline silicon embedded zirconium-doped hafnium oxide high-k memory device

# publications[].label
DIFFUSIONAL MASS-TRANSFER THROUGH SOLVENT MEMBRANE BY FACILITATED TRANSPORT - EXPERIMENT

# publications[].label
Hydrogenated amorphous silicon bipolar junction thin film transistors (a-Si:H B-TFTs)

# publications[].label
Memory functions of amorphous silicon-based floating gate MIS capacitors

# publications[].label
A Solid State Thin Film Incandescent Light Emitting Device

# publications[].publisher
Institute of Electrical and Electronics Engineers (IEEE)

# publications[].label
Grain-size effect on a plasma-based copper etch process

# publications[].label
Process effects of copper film over a step etched with a plasma-based process

# publications[].label
Plasma Etching of Copper Thin Film over a Dielectric Step and Electromigration Failure Mechanism

# publications[].label
Some issues on hydrogen and hydrogenation of plasma enhanced chemical vapor deposited films in a-Si : H thin-film transistors

# publications[].label
Narrowing of Broad Band Light Emitted from a SSI-LED

# publications[].label
Copper Oxide Passivation Effect on Electromigration Lifetime of Plasma Etched Copper Lines

# publications[].label
Bayesian Analysis of Hazard Rate, Change Point, and Cost-Optimal Burn-In Time for Electronic Devices

# publications[].publisher
Institute of Electrical and Electronics Engineers (IEEE)

# publications[].label
Tantalum nitride interface layer influence on dielectric properties of hafnium doped tantalum oxide high dielectric constant thin films

# publications[].label
ON THE EFFECT OF BONDED HYDROGEN IN THE LOCAL MICROSTRUCTURE OF PECVD SINX-H FILMS

# publications[].label
Mechanism of a-IGZO TFT device deterioration-illumination light wavelength and substrate temperature effects

# publications[].label
Electrical properties of nano-resistors made from the Zr-doped HfO2 high-k dielectric film

# publications[].label
Additive-gas effects on Cl-2 plasma-based copper-etch process and sidewall attack

# publications[].label
Critical plasma process issues in the fabrication of thin film transistor liquid crystal displays

# publications[].publisher
Institute of Electrical and Electronics Engineers (IEEE)

# publications[].label
Fabrication and characterization of hydrogenated amorphous silicon bipolar thin film transistor (B-TFT)

# publications[].label
Charge trapping and dielectric relaxation in connection with breakdown of high-k gate dielectric stacks

# publications[].label
Si Substrate Effect on Characteristics of Solid State Incandescent Light Emitting Devices

# publications[].label
A 10.5-in-diagonal SXGA active-matrix display

# publications[].label
Numerical Analysis of Oxygen-Related Defects in Amorphous In-W-O Nanosheet Thin-Film Transistor.

# publications[].label
Bayesian Analysis for Accelerated Life Tests Using a Dirichlet Process Weibull Mixture Model

# publications[].publisher
Institute of Electrical and Electronics Engineers (IEEE)

# publications[].label
Temperature Effect on Dielectric Breakdown and Charges Retention of Nanocrystalline Cadmium Selenide Embedded Zr-Doped HfO2 High-k Dielectric Thin Film

# publications[].publisher
Institute of Electrical and Electronics Engineers (IEEE)

# publications[].label
Nonvolatile memory devices with AlOx embedded Zr-doped HfO2 high-k gate dielectric stack

# publications[].label
Performance and Reliability of Nanocrystals Embedded High-k Nonvolatile Memories

# publications[].label
Mechanisms of Charge Storage in nc-RuO Embedded ZrHfO High-k Films

# publications[].label
Light Effects on Charge Trapping and Detrapping of nc-ZnO Embedded ZrHfO High-k MOS Nonvolatile Memories

# publications[].label
Anomalous high rate reactive ion etching process for indium tin oxide

# publications[].label
A new hydrogen chloride plasma-based copper etching process

# publications[].label
Horizontally redundant, split-gate a-Si:H thin film transistors

# publications[].label
A NOVEL LOW THERMAL BUDGET THIN-FILM POLYSILICON FABRICATION PROCESS FOR LARGE-AREA, HIGH-THROUGHPUT SOLAR CELL PRODUCTION

# publications[].label
Microchannel electrophoresis device for separation and in situ detection of proteins

# publications[].label
REACTIVE ION ETCHING OF SPUTTER DEPOSITED TANTALUM WITH CF4, CF3CL, AND CHF3

# publications[].label
A novel plasma-based copper dry etching method

# publications[].label
The p-channel a-Si : H thin film transistor with plasma etched copper electrodes

# publications[].label
Thin film transistors with layered a-Si:H structure

# publications[].label
Resistivity and Barrier Height of Nano-Resistors Made from Zr-Doped HfO2 High-k Dielectric on Si Wafer

# publications[].label
ELECTROMIGRATION OF PLASMA ETCHED COPPER LINES OF VARIOUS WIDTHS AND LENGTHS

# publications[].label
Relaxation behavior and breakdown mechanisms of nanocrystals embedded Zr-doped HfO2 high-k thin films for nonvolatile memories

# publications[].label
CdSe Embedded ZrHfO Gate Dielectric Nonvolatile Memories - Charge Trapping and Breakdown Studies

# publications[].label
Memory Functions of Nanocrystalline ITO Embedded Zirconium-Doped Hafnium Oxide High-k Capacitor with ITO Gate

# publications[].label
Late gastrointestinal toxicity after radiation for prostate cancer.

# publications[].label
PECVD SILICON-NITRIDE AS A GATE DIELECTRIC FOR AMORPHOUS-SILICON THIN-FILM-TRANSISTOR - PROCESS AND DEVICE PERFORMANCE

# publications[].label
Characteristics of Nickel Oxide Modified Zr-Doped HfO2 High-k Thin Films

# publications[].label
Zirconium-doped tantalum oxide gate dielectric films integrated with molybdenum, molybdenum nitride, and tungsten nitride gate electrodes

# publications[].label
Mixed Oxide High-k Gate Dielectrics - Interface Layer Structure, Breakdown Mechanism, and Memories

# publications[].label
Advanced flat-panel displays and materials

# publications[].label
A light emitting device made from thin zirconium-doped hafnium oxide high-k dielectric film with or without an embedded nanocrystal layer

# publications[].label
Material and Electrical Properties of Hole-Trapping Memory Capacitors Composed of nc-ITO Embedded ZrHfO High-k Films

# publications[].label
Temperature Effect on Memory Functions of the nc-CdSe Embedded ZrHfO High-k MOS Device

# publications[].label
Enhancement of SSI-LED Light Emission by Embedding CdS in the Zr-doped HfO2 High-k Film

# publications[].label
Reliability of Complete Plasma Etched Ru/Cu Lines

# publications[].label
Influence of Vertical and Radial Distances of Nano-Resistors in SSI-LEDs on Light Intensity Distributions

# publications[].label
Polycrystalline silicon formation by pulsed rapid thermal annealing of amorphous silicon

# publications[].label
Mechanism and Performance of Floating-Gate a-Si:H TFT Nonvolatile Memory Devices

# publications[].label
Reliability of a-Si:H TFTs and Copper Interconnect Lines for Flexible Electronics

# publications[].label
Control of Edge Shape, Sidewall Profile, and Sidewall Roughness of the Plasma Etched Copper

# publications[].publisher
Institute of Electrical and Electronics Engineers (IEEE)

# publications[].label
FACING THE HEADACHES OF EARLY FAILURES - A STATE-OF-THE-ART REVIEW OF BURN-IN DECISIONS

# publications[].publisher
Institute of Electrical and Electronics Engineers (IEEE)

# publications[].label
ELECTRONICS AND PHOTONICS DIVISION AWARD ADDRESS: Thin Film Transistor and ULSIC Technologies - Parallel or Crossing?

# publications[].label
Ruthenium Modified Zr-Doped HfO2 High-k Thin Films with Low Equivalent Oxide Thickness

# publications[].label
Light emission from conductive paths in nanocrystalline CdSe embedded Zr-doped HfO2 high-k stack

# publications[].label
Study on Lifetimes of Plasma Etched Ru Lines

# publications[].label
Plasma processing in the fabrication of amorphous silicon thin-film-transistor arrays

# publications[].label
Electroluminescence from Metal Oxide Thin Films

# publications[].label
Charge Trapping and Detrapping in nc-RuO Embedded ZrHfO High-k Thin Film for Nonvolatile Memory Applications

# publications[].label
REACTIVE ION ETCHING OF PECVD N+ A-SI-H - PLASMA DAMAGE TO PECVD SILICON-NITRIDE FILM AND APPLICATION TO THIN-FILM TRANSISTOR PREPARATION

# publications[].label
Simulation of Light Intensity and Nano-Resistor Distribution in SSI-LEDs Using Python as a Framework

# publications[].label
(Invited) UV and Gate Stress Induced Defects in Amorphous Indium Gallium Zinc Oxide Thin Film Transistors and Self-Repair

# publications[].label
Oxygen-Based Reactive Ion Etching of Ruthenium Thin Film

# publications[].label
Temperature Influence on Nanocrystals Embedded High-k Nonvolatile Memory Characteristics

# publications[].label
Thermal annealing effect on electrical properties of metal nitride gate electrodes with hafnium oxide gate dielectrics in nano-metric MOS devices

# publications[].label
A New Microchannel Device for Proteins Separation and Identification

# publications[].publisher
Institute of Electrical and Electronics Engineers (IEEE)

# publications[].label
Process and material properties of PECVD boron-doped amorphous silicon films

# publications[].label
Stress-Induced Deterioration of Nanocrystalline ITO Embedded ZrHfO High-k Nonvolatile Memories

# publications[].label
DIFFUSIONAL MASS TRANSFER THROUGH SOLVENT MEMBRANE BY FACILITATED TRANSPORT - EXPERIMENT.

# publications[].label
Poly-Si Thin Film Formation Using a Novel Low Thermal Budget Process

# publications[].label
Temperature Influence on Nanocrystals Embedded High-k Nonvolatile C-V Characteristics

# publications[].label
Charge trapping sites in nc-RuO embedded ZrHfO high-K nonvolatile memories

# publications[].label
Nanocrystalline ruthenium oxide embedded zirconium-doped hafnium oxide high-k nonvolatile memories

# publications[].label
Nonvolatile Memories with Dual-Layer Nanocrystalline ZnO Embedded Zr-Doped HfO2 High-k Dielectric

# publications[].label
Comparison of Temperature and Light Distributions Around Nano-Resistors in SSI-LEDs

# publications[].label
REACTIVE ION ETCH PROCESSES FOR AMORPHOUS-SILICON THIN-FILM TRANSISTORS - A SICL4 BASED CHEMISTRY

# publications[].label
Surface modification of gel-free microchannel surface electrophoresis device for DNA identification

# publications[].label
Memory Functions of Molybdenum Oxide Nanodots-Embedded ZrHfO High-k

# publications[].label
(Gordon E. Moore Medal for Outstanding Achievement in Solid State Science and Technology) Research on Nano and Giga Electronics  Breakthroughs Along the Path

# publications[].label
A New Process Using Two PhotoMasks to Prepare Trilayer Thin Film Transistors

# publications[].label
ECS Transactions - 2007 International Conference on Semiconductor Technology for Ultra Large Scale Integrated Circuits and Thin Film Transistors, ULSIC vs.TFT: Preface

# publications[].label
Nonvolatile memory MOS capacitors made of CdSe embedded ZrHfO high-k gate dielectric

# publications[].label
Study on Oxygen Plasma-Based Copper Etching Process

# publications[].label
(Invited) A Diode-Like Antifuse Device Made of High-K Dielectric

# publications[].label
Failure Analysis of Single and Dual nc-ITO Embedded ZrHfO High-k Nonvolatile Memories

# publications[].label
A Solid-State Thin-Film Incandescent Light-Emitting Device

# publications[].publisher
Institute of Electrical and Electronics Engineers (IEEE)

# publications[].label
Hydrogen bromide plasma-copper reaction in a new copper etching process

# publications[].label
Illumination Light Wavelength Effects on Double-Gate a-IGZO Thin Film Transistor with Top-Gate-to-Source/Drain Offset Structure

# publications[].label
PLASMA-ETCHING AND DEPOSITION FOR A-SI-H THIN-FILM TRANSISTORS

# publications[].label
Light wavelength effect on tungsten oxide dielectric properties

# publications[].label
From the President: Globalization Starting from Science

# publications[].label
Radiation Exposure Effect on Amorphous Silicon Thin Film Transistors

# publications[].label
Thin Film Technologies In Active Matrix Addressing System Of LCDs

# publications[].publisher
SPIE, the international society for optics and photonics

# publications[].label
Doping gas effects on plasma enhanced chemical vapor deposition on heavily phosphorus-doped n(+) silicon film

# publications[].label
USE OF ADSORBENTS FOR RECOVERY OF ACETIC-ACID FROM AQUEOUS-SOLUTIONS .1. FACTORS GOVERNING CAPACITY

# publications[].label
REACTIVE ION ETCHING PROCESSES FOR AMORPHOUS-GERMANIUM ALLOYS

# publications[].label
Light Sensing of a-Si:H pin diode - Wavelength and Intensity Effects

# publications[].label
Nonvolatile Memory Characteristics of Nanocrystalline Molybdenum Oxide Embedded High-k Film - Device Performance and Light Wavelength Effects

# publications[].label
A solid-state incandescent device for single-chip white- light emission

# publications[].label
Bayesian approach to reliability projection for high k dielectric thin films

# publications[].publisher
Institute of Electrical and Electronics Engineers (IEEE)

# publications[].label
Electrical and Optical Characteristics of WOx, ZrHfO, and Tri-Layer WOx Embedded ZrHfO High-k Based SSI-LEDs

# publications[].label
Influence of the roughness of molybdenum back electrode on the photodiode characteristics under He-Ne illumination

# publications[].label
Hysteresis of Transfer Characteristics of Floating-Gate a-Si:H Thin Film Transistor Nonvolatile Memories

# publications[].label
ACETIC-ACID EXTRACTION BY SOLVENT MEMBRANE

# publications[].label
USE OF ADSORBENTS FOR RECOVERY OF ACETIC ACID FROM AQUEOUS SOLUTIONS.

# publications[].label
Charge and discharge of floating-gate amorphous silicon thin-film transistor nonvolatile memories

# publications[].label
Metal Oxide High-k Thin Films - from Gate Dielectrics to Nonvolatile Memories to LEDs

# publications[].label
Novel plasma-based copper dry etching method

# publications[].label
Hole-Trapping Mechanism and SILC of Dual-Layer nc-ITO Embedded ZrHfO High-k Nonvolatile Memories

# publications[].label
Temperature Effects on Charge Storage and Transfer of Nanocrystalline CdSe Embedded Zr-Doped HfO2 MOS Memory Device

# publications[].label
An isothermal annealing study of spontaneous morphology change in electrodeposited copper metallization

# publications[].label
Influence of Embedded a-Si:H Layer Location on Floating-gate a-Si:H TFT Memory Functions

# publications[].label
High Reliability Tungsten-Doped Indium Zinc Oxide Thin Film Transistors for Display Applications

# publications[].label
Plasma-enhanced chemical vapor deposition of silicon nitride below 250 degrees C

# publications[].label
Integration of an amorphous silicon thin film transistor with a microchannel electrophoresis for protein identification

# publications[].label
Statistical Models of Overdispersed Spatial Defects for Predicting the Yield of Integrated Circuits

# publications[].publisher
Institute of Electrical and Electronics Engineers (IEEE)

# publications[].label
Nano-resistor Based Devices  Effects of Size, Structure, and Performance

# publications[].label
Communication-Filtration of Light Emitted from Solid State Incandescent Light Emitting Devices

# publications[].label
Electrical and physical characterization of zirconium-doped tantalum oxide thin films

# publications[].label
Reliability of Complete Plasma Etched Ru/Cu Lines

# publications[].label
Effects of the TaNx interface layer on doped tantalum oxide high-k films

# publications[].label
Geometrical Layout Effect on Light Intensity Distribution in SSI-LED

# publications[].label
EXSORPTION - A CONCEPTUAL STUDY OF A PROPOSED NEW SEPARATION PROCESS.

# publications[].label
Effects of interfacial charges on doped and undoped Hfo <inf>x</inf> stack layer with TiN metal gate electrode for nano-scaled CMOS generation

# publications[].label
Copper fine patterns etched with HBr plasma based processes

# publications[].label
Failure Mechanism of Nano-Resistor Devices

# publications[].label
FACTORS AFFECTING THE MOLYBDENUM LINE SLOPE BY REACTIVE ION ETCHING

# publications[].label
Charge and Discharge of Floating-Gate Amorphous Silicon Thin-Film Transistor Nonvolatile Memories

# publications[].label
A new microchannel device for proteins separation and detection

# publications[].publisher
SPIE, the international society for optics and photonics

# publications[].label
Non-parametric Bayesian modeling of hazard rate with a change point for nanoelectronic devices

# publications[].label
Floating-Gate a-Si:H TFT Nonvolatile Memories

# publications[].label
Characteristics of Nickel Oxide Modified Zr-Doped HfO2 High-k Thin Films

# publications[].label
Copper Oxide Passivation Effect on Electromigration Lifetime of Plasma Etched Copper Lines

# publications[].label
Electromigration study of copper lines on steps prepared by a plasma-based etch process

# publications[].label
Electrical and physical characterization of zirconium-doped tantalum oxide, films

# publications[].label
Electromigration of Cu interconnect lines prepared by a plasma-based etch process

# publications[].label
Progress of Thin Film Transistor Technology - Large-Area Mass Production and Beyond

# publications[].label
Single- and Dual-Layer Nanocrystalline Indium Tin Oxide Embedded ZrHfO High-k Films for Nonvolatile Memories - Material and Electrical Properties

# publications[].label
(Invited) Oxide TFT Applications: Principles and Challenges

# publications[].label
Reactive ion etching of titanium tungsten thin films

# publications[].label
A Solid-State Incandescent Device for Single-Chip White-Light Emission

# publications[].label
Reactive ion etching of indium tin oxide - HBr chemistry

# publications[].label
White light emission from ultrathin tungsten metal oxide film

# publications[].label
THIN-FILM TRANSISTORS WITH GRADED SINX GATE DIELECTRICS

# publications[].label
High conductivity gate metallurgy for TFT/LCD's

# publications[].label
Nonvolatile Memories Based on Nanocrystalline Zinc Oxide Embedded Zirconium-doped Hafnium Oxide Thin Films

# publications[].label
Factors Affecting Light Emission from Solid State Incandescent Light Emitting Devices with Sputter Deposited Zr-Doped HfO2 Thin Films

# publications[].label
Hafnium-doped tantalum oxide high-k dielectrics with sub-2 nm equivalent oxide thickness

# publications[].label
Sub 2 nm Thick Zirconium Doped Hafnium Oxide High-K Gate Dielectrics

# publications[].label
A NEW THIN-FILM TRANSISTOR STRUCTURE AND ITS PROCESSING METHOD FOR LIQUID-CRYSTAL DISPLAYS

# publications[].publisher
SPIE, the international society for optics and photonics

# publications[].label
Simulation of SSI-LED Light Emission Pattern Using Python As a Simulation Framework

# publications[].label
White-light emission from amorphous ZrHfO thin film dielectrics with and without embedded nanocrystalline CdSe dots

# publications[].label
Past Performance Is No Guarantee of Future Results But 116 Years of Continuous Success Is a Sign of a Great Future

# publications[].label
THIN-FILM TRANSISTORS WITH MULTISTEP DEPOSITED AMORPHOUS-SILICON LAYERS

# publications[].label
Bipolar thin-film transistors and method for forming

# publications[].label
Failure analysis of nanocrystals embedded high-k dielectrics for nonvolatile memories

# publications[].publisher
Institute of Electrical and Electronics Engineers (IEEE)

# publications[].label
High temperature reactive ion etching of indium-tin oxide with HBr and CH4 mixtures

# publications[].label
Thin Film Transistor Technology-Past, Present, and Future

# publications[].label
Influence of pin Amorphous Silicon Stack Deposition Sequence on Solar Cell Performance and Degradation

# publications[].label
(Invited) Plasma-Based Thin Film Technology in Fabrication of Nano- to Giga-Sized Electronics

# publications[].label
Geometrical Layout Effect on Light Intensity Distribution in SSI-LED

# publications[].label
Diffusional mass transfer through solvent membrane by facilitated transport - Experiment

# publications[].label
Thin-film transistor and ultra-large scale integrated circuit: Competition or collaboration

# publications[].label
Factors Affecting Reactive Ion Etching Of Corning 7059 Glass

# publications[].publisher
SPIE, the international society for optics and photonics

# publications[].label
Nanocrystals Embedded High-k Nonvolatile Memories - Bulk Film and Nanocrystal Material Effects

# publications[].label
Stability of double gate amorphous In-Ga-Zn-O thin-film transistors with various top gate designs

# publications[].label
Bulk and Interface Material and Electrical Properties of Hafnium-Doped Tantalum Oxide High-K Films

# publications[].label
Large Area Plasma Enhanced Chemical Vapor Deposition of Nonstoichiometric Silicon Nitride

# publications[].label
Solid State Incandescent Light Emitting Device Made of WOx Embedded Zr-Doped HfO2 High-k Stack on Si

# publications[].label
Memory functions of nanocrystalline indium tin oxide embedded zirconium-doped hafnium oxide MOS capacitors

# publications[].label
p(+) layer effects on a-Si:H solar cell performance

# publications[].label
Temperature Effects on Charge Transfer Mechanisms of nc-ITO Embedded ZrHfO High-k Nonvolatile Memory Devices

# publications[].label
Si Wafer Dopant Concentration Effect on Light Emission of Solid State Incandescent Light Emitting Devices

# publications[].label
Light Wavelength Effects on Charge Trapping and Detrapping of AlOx Embedded ZrHfO High-k Stack

# publications[].label
Layer Thickness Effect on Lifetime of Copper Oxide Passivated Plasma Etched Copper Line

# publications[].label
Effect of n(+) Layer Deposition Power on Light Sensing of pin Amorphous Silicon Diodes

# publications[].label
(Digital Presentation) High Performance Back-Channel-Etch Igzo TFT with Self-Passivate HfO2 By Backside Exposure Technology

# publications[].label
Post Deposition Annealing Temperature Effect on White-light Emitting of Sputter Deposited Zr-doped HfO2 Thin Film

# publications[].label
Nanocrystalline MoOx Embedded ZrHfO High-k Memories - Charge Trapping and Retention Characteristics

# publications[].label
CHARACTERIZATION OF INDIUM TIN OXIDE AND REACTIVE ION ETCHED INDIUM TIN OXIDE SURFACES

# publications[].label
Proceeding - Electrochemical Sciety: Preface

# publications[].label
Effect of Incident Light Direction and Metallic Reflector Layer on Light Sensing of Amorphous Silicon Pin Diodes

# publications[].label
Integration of a-InWZnO Thin Film Transistor with Copper Conductive Bridge Random Access Memory for Low Power Consumption Displays

# publications[].label
Reactive ion etching of indium tin oxide by SiCl4- based plasmas - substrate temperature effect

# publications[].label
Charge detrapping and dielectric breakdown of nanocrystalline zinc oxide embedded zirconium-doped hafnium oxide high-k dielectrics for nonvolatile memories

# publications[].label
Memory Functions of Cadmium Sulfide Embedded Zr-Doped HfO2 High-k Dielectrics

# publications[].label
Nonvolatile Amorphous Silicon Thin Film Transistor Memories with the a-Si:H Embedded Gate Dielectric Structure

# publications[].label
Indium-Tin-Oxide Embedded in Zirconium-Doped Hafnium Oxide High-k Dielectric Films for Hole-Based Nonvolatile Memories

# publications[].label
(Invited) Temperature Influence on Current Leakage and Hysteresis of Nc-CdSe Embedded Zr-Doped HfO2 High-k Dielectric Nonvolatile Memory

# publications[].label
PLANARIZATION OF MULTILEVEL METALIZATION PROCESSES: A CRITICAL REVIEW. .

# publications[].label
Communication-Exploration of Plasma Oxidized Copper Oxide as a Copper Passivation Layer

# publications[].label
Electrical and material characteristics of the sub 5 nm hafnium doped tantalum oxide high K film

# publications[].publisher
Institute of Electrical and Electronics Engineers (IEEE)

# publications[].label
A-Si:H TFT Nonvolatile Memories and Copper Interconnect for Rigid and Flexible Electronics

# publications[].label
Amorphous silicon based TFT and MIS nonvolatile memories

# publications[].label
Influence of Vertical and Radial Distances of Nano-Resistors in SSI-LEDs on Light Intensity Distributions

# publications[].label
A SELF-ALIGNED, TRILAYER, A-SIH THIN-FILM TRANSISTOR PREPARED FROM 2 PHOTOMASKS

# publications[].label
Plasma oxidation as an effective method in etching copper interconnect lines at room-temperature

# publications[].label
Crystallization of a-Si Thin Film Using an Ultra Thin n(+) Poly-Si Seed Layer for Solar Cell Applications

# publications[].publisher
Institute of Electrical and Electronics Engineers (IEEE)

# publications[].label
Influence of the nanometer thick interface layer to electrical properties of the 10nm doped metal oxide high k dielectrics

# publications[].publisher
Institute of Electrical and Electronics Engineers (IEEE)

# publications[].label
Gate dielectric material and process effects on distribution pattern of nano-resistors in solid-state incandescent light emitting devices

# publications[].label
Capping Layer Effect on Lifetime of Plasma Etched Copper Lines

# publications[].label
Influence of Ru Dopant on the Dielectric Properties of Zr-doped HfO2 High-k Thin Film

# publications[].label
Engineering the nm-thick interface layer formed between a high-k film and silicon

# publications[].label
High-performance organic-inorganic hybrid optocouplers based on organic light-emitting diodes and alpha-Si:H photodiodes

# publications[].label
ETCH MECHANISM IN THE LOW REFRACTIVE-INDEX SILICON-NITRIDE PLASMA-ENHANCED CHEMICAL-VAPOR-DEPOSITION PROCESS

# publications[].label
(Invited) A Metal Oxide Antifuse-Diode Device

# publications[].label
Introduction to the Focus Issue on Oxide Thin Film Transistors

# publications[].label
Plasma enhanced chemical vapor deposited silicon nitride as a gate dielectric film for amorphous silicon thin film transistors - a critical review

# publications[].label
Boron-doped A-Si : H thin film deposition process and applications in P-channel thin film transistor and photodiode for He-Ne laser light detection

# publications[].label
Effect of long-term He-Ne laser light exposure and subsequent annealing on hydrogenated amorphous silicon pin photodiodes

# publications[].label
Layer Thickness Effect on Lifetime of Copper Oxide Passivated Plasma Etched Copper Line

# publications[].label
Zirconium-doped hafnium oxide high-k dielectrics with subnanometer equivalent oxide thickness by reactive sputtering

# publications[].label
n-channel and p-channel a-Si : H thin-film transistors with copper electrodes

# publications[].label
Effect of temperature on incubation time for spontaneous morphology change in electrodeposited copper metallization

# publications[].label
REACTIVE ION ETCHING OF PECVD AMORPHOUS-SILICON AND SILICON-NITRIDE THIN-FILMS WITH FLUOROCARBON GASES

# publications[].label
Charge trapping of ultra-thin ZrHfOx/RuOx/ZrHfOx high-k stacks

# publications[].publisher
Institute of Electrical and Electronics Engineers (IEEE)

# publications[].label
REACTIVE ION ETCHING OF SPUTTER DEPOSITED TANTALUM OXIDE AND ITS ETCH SELECTIVITY TO TANTALUM

# publications[].label
Plasma processing in the fabrication of amorphous silicon thin-film-transistor arrays

# publications[].label
Stress testing and characterization of high-k dielectric thin films

# publications[].publisher
Institute of Electrical and Electronics Engineers (IEEE)

# publications[].label
Forming an interconnect of a semiconductor device

# publications[].label
Light Sensing of a-Si:H p-i-n Diode-Mechanism of Asymmetric Charge Carrier Transfer

# publications[].publisher
Institute of Electrical and Electronics Engineers (IEEE)

# publications[].label
Hafnium-doped tantalum oxide high-k gate dielectrics

# publications[].label
Mixed Oxide High-K Dielectrics - from Gate Dielectrics to Non-Volatile Memories to SSI-LEDs

# publications[].label
Effects of post metallization annealing on the electrical reliability of ultra-thin HfO(2) films with MoN and WN gate electrodes

# publications[].publisher
Institute of Electrical and Electronics Engineers (IEEE)

# publications[].label
Physical and electrical properties of Ta-N, Mo-N, and W-N electrodes on HfO2 high-k gate dielectric

# publications[].label
Metal Capping Layer Effects on Electromigration Failure Phenomena of Plasma Etched Copper Lines

# publications[].label
Improvement of zirconium-doped hafnium oxide high-k dielectric properties by adding molybdenum

# publications[].label
Passivation of the 157 nm pellicle with nanometer thin films

# publications[].publisher
SPIE, the international society for optics and photonics

# publications[].label
Electrical and Optical Characteristics of WOx, ZrHfO, and Tri-Layer WOx Embedded ZrHfO High-k Based SSI-LEDs

# publications[].label
Multifunctional Amorphous Metal Oxide Thin Films - Structure Transformation for Various Functions

# publications[].label
Two-level differential burn-in policy for spatially heterogeneous defect units in semiconductor manufacturing

# publications[].label
Substrate Effect on Light Emission of SSI-LEDs

# publications[].label
Influence of a 5 A tantalum nitride interface layer on dielectric properties of zirconium-doped tantalum oxide high-k films

# publications[].label
Embedding of Nanocrystalline Ruthenium in ZrHfO High-k Film for Nonvolatile Memories

# publications[].label
Emission spectra study of plasma enhanced chemical vapor deposition of intrinsic, n +, and p + amorphous silicon thin films

# publications[].label
USE OF ADSORBENTS FOR RECOVERY OF ACETIC-ACID FROM AQUEOUS-SOLUTIONS .3. SOLVENT REGENERATION

# publications[].label
Study of Electrothermal Characteristics and Emitted Light Characteristics of SSI-LED

# publications[].label
Post Deposition Annealing Atmosphere Effect on SSI-LEDs Made of Zr-Doped HfO2 High-k Gate Dielectric

# publications[].label
Sputter deposition of nm-thick films for passivation of organic pellicles

# publications[].label
Amorphous IGZO TFTs with Low Electrical Hysteresis By Using Two-Photomask Process

# publications[].label
REACTIVE ION ETCHING TECHNOLOGY IN THIN-FILM-TRANSISTOR PROCESSING

# publications[].label
Light Wavelength Effects on Performance of a-Si:H PIN Photodiodes

# publications[].label
Plasma hydrogenation - A new method of reducing the k value of the low k polyimide film

# publications[].label
Influence of the 5 A TaNx interface layer on dielectric properties of the Zr-doped TaOX high-k film

# publications[].label
P+ layer effects on a-Si:H solar cell performance

# publications[].publisher
Institute of Electrical and Electronics Engineers (IEEE)

# publications[].label
(Edward G. Acheson Award) Exploration of Amorphous Thin Film Electronics

# publications[].label
Method of forming a conductive pattern by removing a compound with heat in a substantially inert atmosphere

# publications[].label
Light Emission Enhancement by Embedding Nanocrystalline Cadmium Selenide in Amorphous ZrHfO High-k Dielectric Thin Film Deposited on Silicon Wafer

# publications[].label
Pulsed Rapid Thermal Annealing as a Low Thermal Budget Semiconductor Fabrication Process

# publications[].label
Breakdown phenomena of zirconium-doped hafnium oxide high-k stack with an inserted interface layer

# publications[].label
Micro light emitting device prepared from sputter deposited thin hafnium oxide film

# publications[].label
Reliability of nc-ZnO Embedded ZrHfO High-k Nonvolatile Memory Devices Stressed at High Temperatures

# publications[].label
Nonvolatile Memories for Nano and Giga Electronics

# publications[].label
Proceedings - Electrochemical Society: Preface

# publications[].label
High Temperature Reactive Ion Etching of IndiumTin Oxide

# publications[].label
Temperature Effects on Nanocrystalline Molybdenum Oxide Embedded ZrHfO High-k Nonvolatile Memory Functions

# publications[].label
Si Substrate Effect on Characteristics of Solid State Incandescent Light Emitting Devices

# publications[].label
Reactive Ion Etching Of A Multicomponent Glass Substrate

# publications[].publisher
SPIE, the international society for optics and photonics

# publications[].label
(Invited) UV and Gate Stress Induced Defects in Amorphous Indium Gallium Zinc Oxide Thin Film Transistors and Self-Repair

# researcherOn[].label
Collaborative Research: Defects Driven Reliability Modeling and Stress Burn-in Optimization in Nanoelectronics Manufacturing

# researcherOn[].awardedBy.label
National Science Foundation - (Arlington, Virginia, United States)

# streetAddress
Texas A&M University; Chemical Engineering; 3122 TAMU

# organizations[]
Texas A&M Engineering Experiment Station (TEES)

# schools[]
Texas A&M Engineering Experiment Station (TEES)

# inTheNews[].label
Committing to Solving Humanity's Grand Challenges

# etdChairOf[].label
Lee, I-Syuan (2014-05). Polycrystalline Silicon Solar Cells Fabricated by Pulsed Rapid Thermal Annealing of Amorphous Silicon. Master's Thesis.